Development of Blue Laser Direct-Write Lithography System

  • Hao-Wen Chang Graduate Institute of Electro-Optical and Materials Science, National Formosa University
Keywords: lithography, laser direct-write, blue ray, optical pickup head, voice coil motor

Abstract

The optical lithography system researched in this study adopted the laser direct-write lithography technology with nano-positioning stage by using retailing blue ray optical pickup head contained 405nm wavelength and 0.85 numerical aperture of focus lens as the system lighting source. The system employed a photodiode received the focusing error signal reflected by the glass substrate to identify specimen position and automatic focused control with voice coil motor. The pattern substrate was loaded on a nano-positioning stage; input pattern path automatically and collocate with inner program at the same time. This research has successfully developed a blue laser lithography process system. The single spot size can be narrowed down to 3.07 μm and the linewidth is 3.3μm, time of laser control can reach to 450 ns and the exposure pattern can be controlled by program as well.

References

O. Nalamasu, M. Cheng, A. G. Timko, V. Pol, E. Reichmanis, and L. F. Thompson, “An Overview of Resist Processing for Deep-UV Lithography,” Journal of Photopolymer Science and Technology, vol. 4, pp. 299-318, 1991.

C. Vieu, F. Carcenac, A. Pepin, Y. Chen, M. Mejias, A. Lebib, L. Manin-Ferlazzo, L. Couraud, H. Launois , “Electron beam lithography: resolution limits and applications,” Applied Surface Science , vol. 164, pp. 111-117, 2000.

T. R. Groves, D. Pickard, B. Rafferty, N. Crosland, D. Adam, G. Schubert, “Maskless electron beam lithography: prospects, progress, and challenges,” Microelectronic Engineering, vol. 61-62, pp. 285-293, 2002.

A. Heuberger, “X-ray Lithography,” Journal of Vacuum Science & Technology B, vol. 6, pp. 107-121, 1988.

S. Y. Chou, P. R. Krauss, P. J. Renstrom, “Imprint Lithography with 25-Nanometer Resolution,” Science, vol. 272, pp. 85-87, 1995.

P. R. Krauss, S. Y. Chou, “Fabrication of Planar Quantum Magnetic Disk Structure using Electron,” Journal of Vacuum Science & Technology B, vol. 13, pp. 2850-2857, 1995.

S. Y. Chou, P.R. Krauss, P. J. Renstrom, “Imprint of sub-25 nm vias and trenches in polymers,” Applied physics letters, vol. 67, pp. 3114-3116, 1995.

S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Nanoimprint Lithography,” Journal of Vacuum Science & Technology B, vol. 14, No. 6, pp. 4129-4132, 1996.

T. Bailey, B. J. Choi, M. Colburn, M. Meissl, S. Shaya, J. G. Ekerdt, S. V. Sreenivasan, C. G. Willson, “Step and flash imprint lithography template surface treatment and defect analysis,” Journal of Vacuum Science & Technology B, vol. 18, pp. 3572-3577, 2000.

S. Y. Hwang, S. H. Hong, H. Y. Jung , H. Lee, 2005, “Fabrication of roll imprint stamp for continuous UV roll imprinting process,” Microelectronic Engineering, vol. 78, pp. 359-363.

C. P. Liu, Y. X. Huang, C. C. Hsu, T. R. Jeng, J. P. Chen, “Nanoscale Fabrication Using Thermal Lithography Technique,” IEEE Transaction on Magnetics, vol. 45, pp. 2206-2208, 2009.

C. P. Liu, C. C. Hsu, T. R. Jeng, J. P. Chen, “Enhancing nanoscale patterning on Ge–Sb–Sn–O inorganic resist film by introducing oxygen during blue laser-induced thermal lithography,” Journal of Alloys and Compounds, vol. 488, pp. 190-194, 2009.

Published
2012-01-01
How to Cite
[1]
H.-W. Chang, “Development of Blue Laser Direct-Write Lithography System”, Int. j. eng. technol. innov., vol. 2, no. 1, pp. 63-71, Jan. 2012.
Section
Articles